Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML)

Researchers at Carl Zeiss SMT and ASML published a technical paper titled “Hyper-NA: a system with a numerical aperture of at least 0.75.” Abstract Summary: The researchers examine Hyper-NA EUV lithography with a numerical aperture of at least 0.75 as a path beyond current 0.55-NA High-NA systems, including the optical architecture, resolution potential, reticle 3D... read more The post Hyper-NA EUV: The Next Extension Beyond High NA Lithography (Carl Zeiss, ASML) appeared first on Semiconductor Engineering. ]]>