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Chip Industry Technical Paper Roundup: Oct. 6

SemiEngineeringSemiEngineering1天前00

Low-contact-resistance WSe₂ transistors; backside clock meshes for 2nm GAAFETs; row-parallel processing in DRAM; HBF for high-throughput LLM serving; formal security analysis of CAN XL; abstraction an

Low-contact-resistance WSe₂ transistors; backside clock meshes for 2nm GAAFETs; row-parallel processing in DRAM; HBF for high-throughput LLM serving; formal security analysis of CAN XL; abstraction and validation from physical devices to RTL. The post Chip Industry Technical Paper Roundup: Oct. 6 appeared first on Semiconductor Engineering. ]]>

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